Merge pull request #64 from efabless/pres_google

Adding PRES table for GF180MCU DRC

klayout/drc/rule_decks/pres.drc

@@ -0,0 +1,110 @@
+# frozen_string_literal: true
+
+################################################################################################
+# Copyright 2022 GlobalFoundries PDK Authors
+#
+# Licensed under the Apache License, Version 2.0 (the "License");
+# you may not use this file except in compliance with the License.
+# You may obtain a copy of the License at
+#
+#     https://www.apache.org/licenses/LICENSE-2.0
+#
+# Unless required by applicable law or agreed to in writing, software
+# distributed under the License is distributed on an "AS IS" BASIS,
+# WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied.
+# See the License for the specific language governing permissions and
+# limitations under the License.
+################################################################################################
+
+if FEOL
+  #================================================
+  #----------------P+ POLY RESISTOR----------------
+  #================================================
+
+  logger.info('Starting PRES derivations')
+  pres_poly = poly2.and(pplus).interacting(sab).interacting(res_mk).not_interacting(resistor)
+
+  # Rule PRES.1: Minimum width of Poly2 resistor is 0.8µm.
+  logger.info('Executing rule PRES.1')
+  pres1_l1 = pres_poly.width(0.8.um, euclidian)
+  pres1_l1.output('PRES.1', 'PRES.1 : Minimum width of Poly2 resistor: 0.8µm')
+  pres1_l1.forget
+
+  # Rule PRES.2: Minimum space between Poly2 resistors is 0.4µm.
+  logger.info('Executing rule PRES.2')
+  pres2_l1 = pres_poly.isolated(0.4.um, euclidian)
+  pres2_l1.output('PRES.2', 'PRES.2 : Minimum space between Poly2 resistors: 0.4µm')
+  pres2_l1.forget
+
+  # Rule PRES.3: Minimum space from Poly2 resistor to COMP is 0.6.um.
+  logger.info('Executing rule PRES.3')
+  pres3_l1 = pres_poly.separation(comp, 0.6.um, euclidian).polygons(0.001.um)
+  pres3_l2 = comp.not_outside(pres_poly)
+  pres3_l  = pres3_l1.or(pres3_l2)
+  pres3_l.output('PRES.3', 'PRES.3 : Minimum space from Poly2 resistor to COMP: 0.6.um')
+  pres3_l.forget
+  pres3_l1.forget
+  pres3_l2.forget
+
+  # Rule PRES.4: Minimum space from Poly2 resistor to unrelated Poly2 is 0.6µm.
+  logger.info('Executing rule PRES.4')
+  pres4_l1 = pres_poly.separation(poly2.not_interacting(sab), 0.6.um, euclidian)
+  pres4_l1.output('PRES.4', 'PRES.4 : Minimum space from Poly2 resistor to unrelated Poly2: 0.6µm')
+  pres4_l1.forget
+
+  # Rule PRES.5: Minimum Plus implant overlap of Poly2 resistor is 0.3µm.
+  logger.info('Executing rule PRES.5')
+  pres5_l1 = pres_poly.enclosed(pplus, 0.3.um, euclidian).polygons(0.001.um)
+  pres5_l2 = pres_poly.not_outside(pplus).not(pplus)
+  pres5_l  = pres5_l1.or(pres5_l2)
+  pres5_l.output('PRES.5', 'PRES.5 : Minimum Plus implant overlap of Poly2 resistor: 0.3µm')
+  pres5_l1.forget
+  pres5_l2.forget
+  pres5_l.forget
+
+  # Rule PRES.6: Minimum salicide block overlap of Poly2 resistor in width direction is 0.28µm.
+  logger.info('Executing rule PRES.6')
+  pres6_l1 = pres_poly.enclosed(sab, 0.28.um)
+  pres6_l1.output('PRES.6', 'PRES.6 : Minimum salicide block overlap of Poly2 resistor in width direction: 0.28µm')
+  pres6_l1.forget
+
+  # Rule PRES.7: Minimum space from salicide block to contact on Poly2 resistor is 0.22.um.
+  logger.info('Executing rule PRES.7')
+  pres7_l1 = contact.and(pres_poly).separation(sab, 0.22.um).polygons(0.001.um)
+  pres7_l2 = contact.and(pres_poly).interacting(sab)
+  pres7_l = pres7_l1.or(pres7_l2)
+  pres7_l.output('PRES.7', 'PRES.7 : Minimum space from salicide block to contact on Poly2 resistor: 0.22.um')
+  pres7_l1.forget
+  pres7_l2.forget
+
+  # Rule PRES.8 is not a DRC check
+  ## Please refer to https://gf180mcu-pdk.readthedocs.io/en/latest/physical_verification/design_manual/drm_10_01.html#p-poly-resistor-pres
+
+  # Rule PRES.9a: Pplus Poly2 resistor shall be covered by RES_MK marking.
+  ## RES_MK length shall be coincide with resistor length (Defined by SAB length)
+  ## and width covering the width of Poly2.
+  logger.info('Executing rule PRES.9a')
+  mk_pres9a = res_mk.edges.not(poly2.and(pplus).and(sab).edges).inside_part(poly2)
+  pres9a_l1 = res_mk.interacting(pres_poly).interacting(mk_pres9a)
+  pres9a_l1.output('PRES.9a',
+                   'PRES.9a : Pplus Poly2 resistor shall be covered by RES_MK marking.
+                    RES_MK length shall be coincide with resistor length (Defined by SAB length)
+                    and width covering the width of Poly2.')
+  pres9a_l1.forget
+  mk_pres9a.forget
+
+  # Rule PRES.9b: If the size of single RES_MK mark layer is greater than 15000um2
+  ## and both side (X and Y) are greater than 80um.
+  ## then the minimum spacing to adjacent RES_MK layer is 20µm.
+  logger.info('Executing rule PRES.9b')
+  pres9b = res_mk.with_area(15_000.001.um, nil).edges.with_length(80.001.um, nil)
+  pres9b_l1 = pres9b.separation(res_mk.edges, 20.um)
+  pres9b_l1.output('PRES.9b',
+                   'PRES.9b : If the size of single RES_MK mark layer is greater than 15000um2
+                    and both side (X and Y) are greater than 80um.
+                    then the minimum spacing to adjacent RES_MK layer: 20µm')
+  pres9b_l1.forget
+  pres9b.forget
+  pres_poly.forget
+
+end