Merge pull request #65 from efabless/lres_google

Adding LRES table for GF180MCU DRC

klayout/drc/rule_decks/lres.drc

@@ -0,0 +1,112 @@
+# frozen_string_literal: true
+
+################################################################################################
+# Copyright 2022 GlobalFoundries PDK Authors
+#
+# Licensed under the Apache License, Version 2.0 (the "License");
+# you may not use this file except in compliance with the License.
+# You may obtain a copy of the License at
+#
+#     https://www.apache.org/licenses/LICENSE-2.0
+#
+# Unless required by applicable law or agreed to in writing, software
+# distributed under the License is distributed on an "AS IS" BASIS,
+# WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied.
+# See the License for the specific language governing permissions and
+# limitations under the License.
+################################################################################################
+
+if FEOL
+  #================================================
+  #----------------N+ POLY RESISTOR----------------
+  #================================================
+
+  logger.info('Starting LRES derivations')
+
+  poly_nplus = poly2.and(nplus)
+  lres_poly = poly_nplus.interacting(sab).interacting(res_mk)
+
+  # Rule LRES.1: Minimum width of Poly2 resistor is 0.8µm.
+  logger.info('Executing rule LRES.1')
+  lres1_l1 = lres_poly.width(0.8.um, euclidian)
+  lres1_l1.output('LRES.1', 'LRES.1 : Minimum width of Poly2 resistor: 0.8µm')
+  lres1_l1.forget
+
+  # Rule LRES.2: Minimum space between Poly2 resistors is 0.4µm.
+  logger.info('Executing rule LRES.2')
+  lres2_l1 = lres_poly.isolated(0.4.um, euclidian)
+  lres2_l1.output('LRES.2', 'LRES.2 : Minimum space between Poly2 resistors: 0.4µm')
+  lres2_l1.forget
+
+  # Rule LRES.3: Minimum space from Poly2 resistor to COMP is 0.6um.
+  logger.info('Executing rule LRES.3')
+  lres3_l1 = lres_poly.separation(comp, 0.6.um, euclidian).polygons(0.001.um).or(comp.not_outside(lres_poly))
+  lres3_l1.output('LRES.3', 'LRES.3 : Minimum space from Poly2 resistor to COMP: 0.6.um')
+  lres3_l1.forget
+
+  # Rule LRES.4: Minimum space from Poly2 resistor to unrelated Poly2 is 0.6µm.
+  logger.info('Executing rule LRES.4')
+  lres4_l1 = lres_poly.separation(poly2.not_interacting(sab), 0.6.um, euclidian)
+  lres4_l1.output('LRES.4', 'LRES.4 : Minimum space from Poly2 resistor to unrelated Poly2: 0.6µm')
+  lres4_l1.forget
+
+  # Rule LRES.5: Minimum Nplus implant overlap of Poly2 resistor is 0.3µm.
+  logger.info('Executing rule LRES.5')
+  lres5_l1 = lres_poly.enclosed(nplus, 0.3.um, euclidian).polygons(0.001.um)
+  lres5_l2 = lres_poly.not_outside(nplus).not(nplus)
+  lres5_l  = lres5_l1.or(lres5_l2)
+  lres5_l.output('LRES.5', 'LRES.5 : Minimum Nplus implant overlap of Poly2 resistor: 0.3µm')
+  lres5_l1.forget
+  lres5_l2.forget
+  lres5_l.forget
+
+  # Rule LRES.6: Minimum salicide block overlap of Poly2 resistor in width direction is 0.28µm.
+  logger.info('Executing rule LRES.6')
+  lres6_l1 = lres_poly.enclosed(sab, 0.28.um)
+  lres6_l1.output('LRES.6', 'LRES.6 : Minimum salicide block overlap of Poly2 resistor in width direction: 0.28µm')
+  lres6_l1.forget
+
+  # Rule LRES.7: Minimum space from salicide block to contact on Poly2 resistor is 0.22.um.
+  logger.info('Executing rule LRES.7')
+  cont_lres7 = contact.and(lres_poly)
+  lres7_l1 = cont_lres7.separation(sab, 0.22.um).polygons(0.001.um)
+  lres7_l2 = cont_lres7.interacting(sab)
+  lres7_l = lres7_l1.or(lres7_l2)
+  lres7_l.output('LRES.7', 'LRES.7 : Minimum space from salicide block to contact on Poly2 resistor: 0.22.um')
+  lres7_l.forget
+  lres7_l1.forget
+  lres7_l2.forget
+  cont_lres7.forget
+
+  # Rule LRES.8 is not a DRC check
+  ## Please refer to https://gf180mcu-pdk.readthedocs.io/en/latest/physical_verification/design_manual/drm_10_02.html#n-poly-resistor-low-sheet-rho
+
+  # Rule LRES.9a: Nplus Poly2 resistor shall be covered by RES_MK marking.
+  ## RES_MK length shall be coincide with resistor length (Defined by SAB length)
+  ## and width covering the width of Poly2.
+  logger.info('Executing rule LRES.9a')
+  mk_lres9 = res_mk.edges.not(poly_nplus.and(sab).edges).inside_part(poly2)
+  lres9a_l1 = res_mk.interacting(lres_poly).interacting(mk_lres9)
+  lres9a_l1.output('LRES.9a',
+                   'LRES.9a : Nplus Poly2 resistor shall be covered by RES_MK marking.
+                    RES_MK length shall be coincide with resistor length (Defined by SAB length)
+                    and width covering the width of Poly2. ')
+  lres9a_l1.forget
+  mk_lres9.forget
+  poly_nplus.forget
+
+  # Rule LRES.9b: If the size of single RES_MK mark layer is greater than 15000um2
+  ## and both side (X and Y) are greater than 80um.
+  ## then the minimum spacing to adjacent RES_MK layer is 20µm.
+  logger.info('Executing rule LRES.9b')
+  lres9b = res_mk.with_area(15_000.001.um, nil).edges.with_length(80.001.um, nil)
+  lres9b_l1 = lres9b.separation(res_mk.edges, 20.um)
+  lres9b_l1.output('LRES.9b',
+                   'LRES.9b : If the size of single RES_MK mark layer is greater than 15000um2
+                    and both side (X and Y) are greater than 80um.
+                    then the minimum spacing to adjacent RES_MK layer: 20µm')
+  lres9b_l1.forget
+  lres9b.forget
+  lres_poly.forget
+
+end